VAPOR-PHASE ELECTROLYTIC DEPOSITION - A NOVEL METHOD FOR PREPARATION OF ORIENTATED THIN-FILMS

Authors
UCHIMOTO Y OKADA T OGUMI Z TAKEHARA Z
Citation
Y. Uchimoto et al., VAPOR-PHASE ELECTROLYTIC DEPOSITION - A NOVEL METHOD FOR PREPARATION OF ORIENTATED THIN-FILMS, Journal of the Chemical Society, Chemical Communications, (5), 1994, pp. 585-586
Citations number
12
Categorie Soggetti
Chemistry
Journal title
Journal of the Chemical Society, Chemical Communications → ACNP
ISSN journal
00224936
Issue
5
Year of publication
1994
Pages
585 - 586
Database
ISI
SICI code
0022-4936(1994):5<585:VED-AN>2.0.ZU;2-U
Abstract
A novel method of electrolysis in the vapour phase which is carried ou t using glow-discharge plasma as conductive fluid has been devised for the preparation of orientated Ag+ ion conductive thin Agl films.