MODES OF HYDROGEN INCORPORATION IN HYDROGENATED AMORPHOUS-CARBON (A-C-H), MODIFICATIONS WITH ANNEALING TEMPERATURE

In order to obtain more information about the nature of the hydrogen b onding and the thermal stability of a-C:H films, we have studied two d ifferent types of film's labeled I and II deposited in a d.c. multipol ar plasma system from pure methane at substrate bias equal to -40 and -600 V respectively. A combination of several complementary techniques has been carried out on the samples in their as-deposited state as we ll as after isochronal annealing cycles at increasing temperatures up to 650 degrees C. The results clearly indicate that the two types of s amples have very different H bonding and microstructure in their as-de posited state. They also behave differently upon annealing and still e xhibit quite different microstructures and H bonding configurations up to high annealing temperature.