DEVICE FOR THE SIMULTANEOUS APPLICATION OF UNIAXIAL-STRESS AND HYDROSTATIC-PRESSURE - APPLICATION TO SEMICONDUCTOR-LASERS

Authors
WIDULLE F HELD JT HUBER M HOCHHEIMER HD KOTITSCHKE RT ADAMS AR
Citation
F. Widulle et al., DEVICE FOR THE SIMULTANEOUS APPLICATION OF UNIAXIAL-STRESS AND HYDROSTATIC-PRESSURE - APPLICATION TO SEMICONDUCTOR-LASERS, Review of scientific instruments, 68(11), 1997, pp. 3992-3995
Citations number
6
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
Journal title
Review of scientific instruments → ACNP
ISSN journal
00346748
Volume
68
Issue
11
Year of publication
1997
Pages
3992 - 3995
Database
ISI
SICI code
0034-6748(1997)68:11<3992:DFTSAO>2.0.ZU;2-M
Abstract
The design of a device for the simultaneous application of uniaxial st ress and hydrostatic pressure is presented. Shown in detail is the des ign of the part that applies the uniaxial force to the sample and firs t results of the simultaneous application of uniaxial stress and hydro static pressure to a semiconductor laser. (C) 1997 American Institute of Physics. [S0034-6748(97)04211-1].