STRONG HALL VOLTAGE MODULATION IN HYBRID FERROMAGNET SEMICONDUCTOR MICROSTRUCTURE/

Citation
Fg. Monzon et al., STRONG HALL VOLTAGE MODULATION IN HYBRID FERROMAGNET SEMICONDUCTOR MICROSTRUCTURE/, Applied physics letters, 71(21), 1997, pp. 3087-3089
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
71
Issue
21
Year of publication
1997
Pages
3087 - 3089
Database
ISI
SICI code
0003-6951(1997)71:21<3087:SHVMIH>2.0.ZU;2-B
Abstract
We present a new magnetoelectronic device consisting of a mu m-scale s emiconductor cross junction and a patterned, electrically isolated, fe rromagnetic overlayer:with in-plane magnetization. The large local mag netic field emanating from the edge of the thin ferromagnetic film has a strong perpendicular magnetic component, B-perpendicular to(r), whi ch induces a Hall resistance, R-H,in the microjunction. External appli cation of a weak in-plane magnetic field reverses the magnetization of the ferromagnet and with it B-perpendicular to(r), thus modulating R- H. Our data demonstrate that this strong ''local'' Hall effect is oper ative at both cryogenic-and room temperatures, and is promising for de vice applications such as field sensors or integrated nonvolatile memo ry cells. (C) 1997 American Institute of Physics.