LARGE-AREA PULSED-LASER DEPOSITION OF AURIVILLIUS-TYPE LAYERED PEROVSKITE THIN-FILMS

Citation
A. Pignolet et al., LARGE-AREA PULSED-LASER DEPOSITION OF AURIVILLIUS-TYPE LAYERED PEROVSKITE THIN-FILMS, Ferroelectrics, 202(1-4), 1997, pp. 285-298
Citations number
36
Categorie Soggetti
Physics, Condensed Matter","Material Science
Journal title
ISSN journal
00150193
Volume
202
Issue
1-4
Year of publication
1997
Pages
285 - 298
Database
ISI
SICI code
0015-0193(1997)202:1-4<285:LPDOAL>2.0.ZU;2-Y
Abstract
Thin films of Aurivillius-type layered perovskites of Bi4Ti3O12 and Sr Bi2Ta2O9 have been epitaxially deposited by PLD on SrTiO3 single cryst al substrates. Bi4Ti3O12 has been deposited as well on a CeO2/YSZ/Si(1 00) buffer layer, and on Pt-coated oxidized silicon for electrical mea surements. Using a new technique for large area PLD, Bi4Ti3O12 has als o been deposited on a whole (100)-oriented 3 '' Si wafer. The obtained films have a homogeneous thickness over the whole wafer corresponding to an area of about 45 cm(2). The composition, structure, and electri cal properties of the films are presented.