DIRECT WRITING AND IN-SITU MATERIAL PROCESSING BY A LASER-MICROMACHINING PROJECTION MICROSCOPE

The new laser micromachining projection microscope enables a surface t o be viewed at high magnification with a built-in facility for microma chining of the same surface according to a predetermined pattern. A Xe Cl-excimer laser forms part of the device and provides bright viewing illumination in amplified spontaneous emission as well as a small lase r spot of sufficient fluence to mark the sample surface. The basic cha racteristics of image enhancement in the excimer amplifier are present ed. The advantage of such a technique for both pattern generation, sur face cleaning and mask correction is demonstrated on Al, Cu and W spec imens with a spatial resolution better than 3 mum.