A novel micro-extrusion process (MEP)has been developed for micromachi
ning applications, Extrusions on the micrometer scale were realized us
ing the compressive stresses resulting from electromigration-induced m
ass transport in planarized conductors, Electromigration produced comp
ressive stresses at the anodes of passivated metallic interconnects th
at exceeded the plastic deformation stress, and allowed extrusions to
form through simple die patterns etched through the passivation at the
anode ends of edge-displacement conductor segments.