SUBMICROCHANNEL PLATE MULTIPLIERS

Citation
Av. Raspereza et al., SUBMICROCHANNEL PLATE MULTIPLIERS, Applied surface science, 111, 1997, pp. 295-301
Citations number
28
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
111
Year of publication
1997
Pages
295 - 301
Database
ISI
SICI code
0169-4332(1997)111:<295:SPM>2.0.ZU;2-G
Abstract
A theoretical investigation of alumina micron and submicron multichann el electron amplifiers was carried out. The theoretical study was base d on multiplier performance Monte-Carlo simulation and general concept s of secondary electron emission theory. The simulation was performed for multipliers for which the length-to-diameter ratio was varied from 40 to 60 and the bias voltage from 600 to 1400 V. Calculations were m ade for the linear mode of multiplier operation under single electron stimulus. The simulation showed that alumina plates of the considered configurations are expected to possess a high gain (> 1000 at applied voltages exceeding 1.2 kV). The simulation also demonstrated that subm icrochannel multipliers have faster response (< 30 ps), better tempora l resolution (< 10 ps) and higher tolerance to strong axial (parallel with respect to channel axis) magnetic fields (up to similar to 4 T) t han microchannel plates with the same length-to-diameter ratios. Anodi c alumina submicrochannel plates with channel diameter 0.07-0.4 mu m, length-to-diameter ratio up to 300 and an effective open area up to si milar to 50% have been produced.