SUBSTITUTIONAL PHOSPHORUS DOPING OF DIAMOND BY ION-IMPLANTATION

Citation
H. Hofsass et al., SUBSTITUTIONAL PHOSPHORUS DOPING OF DIAMOND BY ION-IMPLANTATION, Journal of applied physics, 81(6), 1997, pp. 2566-2569
Citations number
35
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
6
Year of publication
1997
Pages
2566 - 2569
Database
ISI
SICI code
0021-8979(1997)81:6<2566:SPDODB>2.0.ZU;2-D
Abstract
We have studied the lattice sites of ion-implanted radioactive P-33 in natural IIa diamond using the emission channeling technique. P-33 ion s were implanted at room temperature with 30 keV and a rather low dose of 10(11) cm(-2) and the implanted samples were annealed in vacuum to 1200 degrees C. From the channeling effects of the emitted beta(-) pa rticles measured for all principal axial directions we obtain a fracti on of 70+/-10% of substitutional P, a vanishing fraction on tetrahedra l interstitial sites and a 30% random fraction. Possible displacements of the P atoms from ideal substitutional sites must be below 0.2 Angs trom. This demonstrates that P is a substitutional impurity in diamond and efficient substitutional P doping of diamond can be accomplished by a conventional implantation and annealing procedure if low implanta tion doses are chosen. (C) 1997 American Institute of Physics.