STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPUTTERED VANADIUM-OXIDE THIN-FILMS FOR APPLICATIONS AS GAS-SENSING MATERIAL

Citation
D. Manno et al., STRUCTURAL AND ELECTRICAL-PROPERTIES OF SPUTTERED VANADIUM-OXIDE THIN-FILMS FOR APPLICATIONS AS GAS-SENSING MATERIAL, Journal of applied physics, 81(6), 1997, pp. 2709-2714
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
6
Year of publication
1997
Pages
2709 - 2714
Database
ISI
SICI code
0021-8979(1997)81:6<2709:SAEOSV>2.0.ZU;2-W
Abstract
A detailed structural and morphological investigation has been carried out by conventional transmission electron microscopy, high resolution electron microscopy and nanodiffraction methods on vanadium oxide fil ms obtained by reactive rf sputter at a high power discharge (1000 W) and different O-2/Ar ratio. Electrical characterization has been also performed in controlled atmosphere in order to investigate the influen ce of NO2 oxidizing gas on the material conductance as a function of d eposition parameters. A strict relation between structure, morphology and resistance variation in controlled atmosphere has been observed. ( C) 1997 American Institute of Physics.