DIFFERENCE OF INTERFACE-TRAP PASSIVATION IN SCHOTTKY CONTACTS FORMED ON (NH4)(2)S-X-TREATED GAAS AND IN0.5GA0.5P

Citation
Cr. Moon et al., DIFFERENCE OF INTERFACE-TRAP PASSIVATION IN SCHOTTKY CONTACTS FORMED ON (NH4)(2)S-X-TREATED GAAS AND IN0.5GA0.5P, Journal of applied physics, 81(6), 1997, pp. 2904-2906
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
6
Year of publication
1997
Pages
2904 - 2906
Database
ISI
SICI code
0021-8979(1997)81:6<2904:DOIPIS>2.0.ZU;2-K
Abstract
The effects of (NH4)(2)S-x treatments on the interface traps in Au/n-G aAs and Au/n-In0.5Ga0.5P Schottky contacts are investigated by deep le vel transient spectroscopy measurements. The interface trap concentrat ion in Au/GaAs increases when the residual S overlayer is sublimated a fter (NH4)(2)S-x treatments. But the trap concentration decreases when the S overlayer is rinsed by de-ionized water. in Au/InGaP, the phosp horus vacancy-related interface traps are passivated effectively by th e (NH4)(2)S-x treatment. These results are attributed to the fact that S bonds with As but not with P. (C) 1997 American Institute of Physic s.