C. Dafonseca et Mdc. Belo, IN-SITU CHARACTERIZATION OF THE ELECTRONI C-STRUCTURE OF AN ANODIC TITANIUM-OXIDE FROM CAPACITANCE MEASUREMENTS, Comptes rendus de l'Academie des sciences. Serie 2, Mecanique, physique, chimie, sciences de l'univers, sciences de la terre, 318(6), 1994, pp. 753-759
A mathematical model to describe the capacitance behaviour of the amor
phous semi-conductor Schottky barrier in the high depletion region is
proposed. The model is based on the admittance theory of the amorphous
silicon Schottky barrier and it is valid for polarisation values wher
e the semi-conductor displays a Mott-Schottky like behaviour. The mode
l is applied to the in situ study of the electronic properties of an a
nodic titanium oxide. The calculated parameters are in good agreement
with the ones calculated from the capacitance study in the low depleti
on region.