o-Nitrobenzyloxycarbonyl and a number of related groups have been test
ed for the photolabile protection of nucleoside 5'-hydroxyls. The rate
s of photodeprotection were found to vary by approximately 17 fold in
a series of 5'-O-protected thymidine derivatives irradiated at 365 nm
under identical conditions. The homologous 2-(o-nitrophenyl)ethoxycarb
onyl group and its derivatives were found to be removed approximately
2-fold faster than the corresponding o-nitrobenzyloxycarbonyl group, p
ossibly due to an increased rare of alpha-hydrogen abstraction by the
photo-excited nitro group. Photolysis rates were affected by substitut
ions on both the phenyl ring and alpha-carbon, with the strongest rate
enhancements caused by the presence of a methyl or second o-nitrophen
yl group in the alpha-position. Among the ring-substituted derivatives
studied, o-nitro and o-iodo had the strongest enhancement effects on
photodeprotection, while an o-fluoro group reduced the rate of photode
protection. In general, substitutions at other positions on the phenyl
ring had less effect on photolysis rates. (C) 1997 Elsevier Science L
td.