The influence of water vapour on the oxidation of Ti-50 at.% Al was st
udied at 900 degrees C. Thick, well-adherent oxide scales were formed
consisting of an outer TiO2 layer and an inner heterogeneous mixture o
f TiO2 and Al2O3. The interface between these layers is marked by larg
e pores and Al2O3 particles embedded in TiO2. No compact Al2O3 barrier
layer was observed. The oxidation leads to formation of a two phase,
oxygen enriched subsurface zone, which is Al-depleted by inner oxidati
on of Al to Al2O3. The oxidation kinetics were followed by continuous
thermogravimetry. Exposure in moist oxygen leads to an accelerated att
ack compared with oxidation in dry oxygen. In moist oxygen the rate is
linear after a short transition period. The oxidation rate is influen
ced by water partial pressure and oxygen partial pressure.