ROUGHENING AND FACETING IN A PB THIN-FILM GROWING ON THE PB(110) SURFACE

Authors
Citation
K. Fang et al., ROUGHENING AND FACETING IN A PB THIN-FILM GROWING ON THE PB(110) SURFACE, Physical review. B, Condensed matter, 49(12), 1994, pp. 8331-8339
Citations number
35
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
49
Issue
12
Year of publication
1994
Pages
8331 - 8339
Database
ISI
SICI code
0163-1829(1994)49:12<8331:RAFIAP>2.0.ZU;2-R
Abstract
Using high-resolution low-energy electron diffraction, we have observe d nonconventional dynamic scaling during the molecular-beam-epitaxy gr owth of Pb/Pb(110). The growth front becomes increasingly rough as mor e Pb atoms are deposited. At a low growth rate, the interface width w changes with deposition time t in a scaling form w approximately t(bet a) with beta = 0.77 +/- 0.05. The other scaling hypothesis involving t he lateral correlation length xi approximately t(beta/alpha) is no lon ger valid and the local roughness increases dramatically. However, the short-range height-height correlation function H(r) still scales with r, the horizontal distance between two points in the surface, in the form of H(r,t) approximately f(t)r2alpha with alpha = 1.33 +/- 0.05. A t the later stage of growth, the rough surface eventually induces an a nistropic {111} faceting. Faceting is found to occur earlier when the deposition rate is high.