THE ELECTRICAL-FIELD EFFECT ON THE GROWTH OF TITANIUM-OXIDE LAYERS BYML-ALE

Citation
Ve. Drozd et al., THE ELECTRICAL-FIELD EFFECT ON THE GROWTH OF TITANIUM-OXIDE LAYERS BYML-ALE, Applied surface science, 112, 1997, pp. 258-263
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
112
Year of publication
1997
Pages
258 - 263
Database
ISI
SICI code
0169-4332(1997)112:<258:TEEOTG>2.0.ZU;2-7
Abstract
Study of the electric field effect on the titanium oxide growth by mol ecular layering (ML)-atomic layer epitaxy (ALE) method was produced in the present work. It was found that electric field effect on the adso rption process of the precursors during ML-ALE cycles under both polar ities of a field. The field affect depended on a stage of a cycle ML-A LE (half-reaction of ML-ALE). The strength of a field strongly influen ced on the thickness of titanium oxide layers in the beginning of a gr owth process until the layer thickness reached 5.0-6.0 nm. It was foun d that field influence did not depend on a sublayer composition. The e lectric field affect at different temperatures and voltages was studie d. It was found that electric field effected a structure of the synthe sized layers. At room temperature we synthesized a rutile structure - the more thermodynamically stable modification of titanium oxide. The explanation of these results was made on the basis of an electronic ad sorption theory.