J. Liu et al., MODIFICATION OF SI FIELD EMITTER SURFACES BY CHEMICAL CONVERSION TO SIC, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 717-721
Silicon field emitters have been modified -by coating with a thin SiC
film through a chemical conversion process. Silicon carbide was formed
on Si emitter surfaces by reacting with ethylene gas at temperatures
between 850 and 950-degrees-C using pressures as high as 5 X 10(-3) To
rr. The thickness of the coatings ranged from 2 to 500 nm, determined
by a combination of reaction time, pressure, and temperature. Stable e
mission currents above 10 mu angstrom were measured from individual Si
C coated emitters.