50-KV PULSE-GENERATOR FOR PLASMA SOURCE ION-IMPLANTATION

Authors
BOHM G GUNZEL R
Citation
G. Bohm et R. Gunzel, 50-KV PULSE-GENERATOR FOR PLASMA SOURCE ION-IMPLANTATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 821-822
Citations number
NO
Categorie Soggetti
Physics, Applied
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
12
Issue
2
Year of publication
1994
Pages
821 - 822
Database
ISI
SICI code
1071-1023(1994)12:2<821:5PFPSI>2.0.ZU;2-F
Abstract
The pulse generator has been especially designed by Puls-Plasmatechnik GmbH for the application of the field of plasma source ion implantati on. The maximum output voltage is -50 kV. The pulse frequency can be a djusted up to 100 Hz. A brief survey is given in this article.