PARTICLE-PRECIPITATION-AIDED CHEMICAL-VAPOR-DEPOSITION OF TITANIUM NITRIDE

Particle-precipitation-aided chemical vapor deposition (PP-CVD) is a m odification of the conventional CVD process, where an aerosol is forme d in the gas phase and particles are deposited on a substrate, The dri ving force for particle deposition is thermophoresis. The synthesis of titanium nitride (TIN) has been studied. TIN is formed on the substra te, as well as in the gas phase, At low temperature differences, only dense microstructures with equiaxed grains are observed; porous cohere nt layers are found in experiments where larger temperature difference s are applied, Additional increase in the temperature difference only leads to loose powder deposits, In principle, the PP-CVD process is a suitable method for the synthesis of thin porous layers of ceramics.