SOURCE OF AN ANNULAR CONTROLLED-RADIUS PLASMA FOR A PLASMA RELATIVISTIC MICROWAVE-OSCILLATOR

Citation
Ot. Loza et al., SOURCE OF AN ANNULAR CONTROLLED-RADIUS PLASMA FOR A PLASMA RELATIVISTIC MICROWAVE-OSCILLATOR, Plasma physics reports, 23(3), 1997, pp. 201-208
Citations number
9
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
ISSN journal
1063780X
Volume
23
Issue
3
Year of publication
1997
Pages
201 - 208
Database
ISI
SICI code
1063-780X(1997)23:3<201:SOAACP>2.0.ZU;2-K
Abstract
A technique of a plasma production for the relativistic plasma microwa ve generator is described. This technique permits the density and radi us of the annular plasma in each shot to be controlled. The results of measurements of the plasma parameters are presented, and the physical processes occurring in the plasma source are discussed.