CONVERSION OF TETRAETHOXYSILANE (TEOS) TO SILICA FILM-FORMING PRECURSORS IN ATOMIC OXYGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION (VOL 2, PG 285,1996)

Authors
WROBEL AM WALKIEWICZPIETRZYKOWSKA A STASIAK M KULPINSKI J
Citation
Am. Wrobel et al., CONVERSION OF TETRAETHOXYSILANE (TEOS) TO SILICA FILM-FORMING PRECURSORS IN ATOMIC OXYGEN-INDUCED CHEMICAL-VAPOR-DEPOSITION (VOL 2, PG 285,1996), CHEMICAL VAPOR DEPOSITION, 3(2), 1997, pp. 73-73
Citations number
1
Categorie Soggetti
Materials Science, Coatings & Films","Materials Sciences, Composites",Electrochemistry,"Physics, Condensed Matter
Journal title
CHEMICAL VAPOR DEPOSITION → ACNP
ISSN journal
09481907
Volume
3
Issue
2
Year of publication
1997
Pages
73 - 73
Database
ISI
SICI code
0948-1907(1997)3:2<73:COT(TS>2.0.ZU;2-0