Pa. Lane et al., GROWTH OF IRON, NICKEL, AND PERMALLOY THIN-FILMS BY MOCVD FOR USE IN MAGNETORESISTIVE SENSORS, CHEMICAL VAPOR DEPOSITION, 3(2), 1997, pp. 97-101
Thin films of elemental iron and nickel, plus a wide composition range
of iron-nickel alloys, have been deposited by atmospheric pressure me
tal organic chemical vapor deposition at a growth temperature of 200 d
egrees C, using iron pentacarbonyl and nickel tetracarbonyl as the sou
rce precursors. Detailed magnetoresistance measurements of the permall
oy layers showed that the maximum value of magnetoresistance occurred
at a composition of approximately 90 % Ni10 % Fe, and the maximum sens
itivity occurred at approximately 80 % Ni20 % Fe, in accordance with l
iterature values. In addition, both the application of an 80 mT magnet
ic field during deposition and the annealing of samples at temperature
s higher than the growth temperature of 200 degrees C improved the mag
netic properties.