MICROFABRICATED ELECTROCHEMICAL SENSOR FOR THE DETECTION OF RADIATION-INDUCED DNA-DAMAGE

Citation
J. Wang et al., MICROFABRICATED ELECTROCHEMICAL SENSOR FOR THE DETECTION OF RADIATION-INDUCED DNA-DAMAGE, Analytical chemistry, 69(7), 1997, pp. 1457-1460
Citations number
8
Categorie Soggetti
Chemistry Analytical
Journal title
ISSN journal
00032700
Volume
69
Issue
7
Year of publication
1997
Pages
1457 - 1460
Database
ISI
SICI code
0003-2700(1997)69:7<1457:MESFTD>2.0.ZU;2-#
Abstract
An electrochemical biosensor protocol for the detection of radiation-i nduced DNA damage is described, The procedure employs a dsDNA-coated s creen-printed electrode and relies on changes in the guanine-DNA oxida tion signal upon exposure to ultraviolet radiation, The decreased sign al is ascribed primarily to conformational changes in the DNA and to t he photoconversion of the guanine-DNA moiety to a nonelectroactive mon omeric base product. Factors influencing the response of these microfa bricated DNA sensors, such as irradiation time, wavelength, and distan ce, are explored, and future prospects are discussed, Similar results are given for the use of bare strip electrodes in connection with irra diated DNA solutions.