Bo. Aronsson et al., GLOW-DISCHARGE PLASMA TREATMENT FOR SURFACE CLEANING AND MODIFICATIONOF METALLIC BIOMATERIALS, Journal of biomedical materials research, 35(1), 1997, pp. 49-73
Glow discharge plasma treatment is a frequently used method for cleani
ng, preparation, and modification of biomaterial and implant surfaces.
The merits of such treatments are, however, strongly dependent on the
process parameters. In the present work the possibilities, limitation
s, and risks of plasma treatment for surface preparation of metallic m
aterials are investigated experimentally using titanium as a model sys
tem, and also discussed in more general terms. Samples were treated by
different low-pressure direct current plasmas and analyzed using Auge
r electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS),
atomic force microscopy, scanning electron microscopy, and light micr
oscopy. The plasma system is a home-built, ultra-high vacuum-compatibl
e system that allows sample introduction via a load-lock, and precise
control of pressure, gas composition and flow rate, etc. This system a
llows uniform treatment of cylindrical and screw-shaped samples. With
appropriate plasma parameters, argon plasma remove all chemical traces
from former treatments (adsorbed contaminants and other impurities, a
nd native oxide layers), in effect producing cleaner and more well-con
trolled surfaces than with conventional preparation methods. Removal (
sputtering) rates up to 30 nm/min are possible. However, when inapprop
riate plasma parameters are used, the result may be increased contamin
ation and formation of unintentional or undesired surface layers (e.g.
, carbides and nitrides). Plasma-cleaned surfaces provide a clean and
reproducible starting condition for further plasma treatments to form
well-controlled surface layers. Oxidation in pure O-2 (thermally or in
oxygen plasmas) results in uniform and stoichiometric TiO2 surface ox
ide layers of reproducible composition and thicknesses in the range 0.
5-150 nm, as revealed by AES and XPS analyses. Titanium nitride layers
were prepared by using N-2 plasmas. While mild plasma treatments leav
e the surface microstructure unaffected, heavy plasma treatment can gi
ve rise to dramatic morphologic changes. Comparison of these results w
ith corresponding analyses of commercial implants and electropolished
and/or anodically oxidized samples shows that the plasma treatment off
ers superior control of the surface status. However, it is also shown
that improper control of the plasma process can produce unwanted and i
rreproducible results. (C) 1997 John Wiley & Sons, Inc.