RESISTIVE HOSE INSTABILITY FOR ARBITRARY SKIN DEPTH

Resistive hose growth for moderate or large skin depth differs from th at derived from a conductivity model. Asymptotic growth is calculated for the Bennett equilibrium, incorporating the inductive component in the plasma return current, with phase mixing accounted for via the 'di stributed-mass' model. Analytic scalings are checked with numerical so lutions of the linearized model. For a ratio of skin depth to beam rad ius of less than 1/10 the conductivity model appears quite adequate. W hen this ratio exceeds 1/4 inductive corrections appear.