Ac. Crossland et al., THE COMPOSITION AND MORPHOLOGY OF ANODIC FILMS ON AL-MO ALLOYS, Journal of the Electrochemical Society, 144(3), 1997, pp. 847-855
The growth of barrier-type anodic films on amorphous Al-Mo alloys, con
taining 16 to 40 atom percent Mo, in berate electolyte was investigate
d by analytical transmission electron microscopy, Rutherford backscatt
ering spectroscopy, secondary ion mass spectrometry, and extended x-ra
y absorption spectroscopy. During growth at 1 and 5 mA cm(-2), two-lay
ered amorphous oxide films formed at high efficiency by outward migrat
ion of cations and inward migration of oxygen ions; the outer layer is
composed of units of alumina contaminated by boron species derived fr
om the electrolyte and the inner layer contains units of both Al2O3 an
d MoO3 distributed uniformly at the resolution of the analyses. At 0.1
mA cm(-2) the films form at reduced faradaic efficiency, which result
s in a decreased thickness of the outer alumina layer. The two-layered
films develop as a consequence of faster migration of Al3+ ions than
Mo6+ ions within the inner layers of the films. New film material form
s at the alloy/film and film/electrolyte interfaces and at the interfa
ce between the inner and outer layers. At the alloy/film interface, a
thin layer of alloy is highly enriched in molybdenum as a consequence
of anodic oxidation. Due to the mechanism of film growth, a high conce
ntration of boron accumulates in a sublayer of film material just abov
e the inner/outer layer interface.