Optical breakdown on Ar films is studied in an intensity range from 10
(6) to 2 x 10(9) W/cm2 for wavelengths of 228, 281 and 282.8 nm. The a
mount of ablated H2O, N2, O2 and Ar increases quadratically with laser
intensity and depends strongly on the exposure time to residual gas a
nd on substrate temperature around 24 K. The results can be explained
by a model which assumes that the dominant process causing ablation is
the heating of a condensed residual gas layer by two-photon absorptio
n.