SPUTTERING YIELDS OF THIN-FILMS FOR MEV MICROBEAM IRRADIATION - PRELIMINARY-RESULTS

Experimental sputtering yields of thin films for 1.725 MeV H-1(+) bomb ardment have been measured on various targets of thicknesses from 2 to 320 nm: carbon, titanium, chromium, nickel, tantalum, tantalum oxide and gold. The results are compared to old models from Goldman and Kami nsky and to Sigmund's theory. Relatively good agreement between experi mental data and theory is found. The influence of some parameters incl uding the nature of the target, the target thickness, the nature of th e substrate and the nature of the projectile is discussed.