NEW GRATING FABRICATION TECHNOLOGY FOR OPTOELECTRONIC DEVICES - CASCADED SELF-INDUCED HOLOGRAPHY

A method of fabricating submicron gratings for optoelectronic devices from a glass mask was proposed and demonstrated. The glass mask has gr atings on both sides with a period of at least four times of the final feature size. By modifying the grating periods on the mask, one can a chieve multiple-period gratings with a very fine period spacing for ad vanced wavelength division multiplexing (WDM) devices. In this letter, we demonstrated 0.5 mu m second-order gratings for 1.55 mu m distribu ted-feedback lasers and gratings with a 6 Angstrom period difference f or WDM laser arrays using only optical sources. (C) 1995 American Inst itute of Physics.