Gf. Dallabetta et al., DESIGN OF AN N-CHANNEL JFET ON HIGH-RESISTIVITY SILICON FOR RADIATION-DETECTOR ON-CHIP FRONT-END ELECTRONICS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 365(2-3), 1995, pp. 473-479
We report on the design of an n-channel Junction Field Effect Transist
or (JFET) on fully-depleted, high-resistivity (5 k Omega cm), n-type s
ilicon substrate, which is intended to be utilized as an active device
in the on-chip preamplifier of the silicon radiation detectors we are
developing. Two-dimensional process and device simulations are employ
ed to optimize the device doping profile, as well as to point out some
important advantages of the proposed structure over possible alternat
ive device designs. In particular, the proposed JFET, in which an exte
rnally-contacted, p-type well isolates the active device from the high
-resistivity substrate, presents higher output-resistance values than
a device directly fabricated on substrate. Moreover, it is not affecte
d by a parasitic phenomenon resulting in gate-current increase and noi
se-performance degradation, which, in contrast, characterizes a device
with a floating well.