H. Byrd et al., MECHANISTIC STUDIES OF FILM GROWTH OF ZIRCONIUM BIS(PHOSPHONATE) MONOLAYER AND MULTILAYER THIN-FILMS - THESE THINGS GROW DARNED FLAT, Langmuir, 11(11), 1995, pp. 4449-4453
Atomic force microscopy (AFM) was used to study thin film growth of zi
rconium bis(phosphonate) films on silicon substrates under water. We o
bserved a monolayer of zirconium 1,16-hexadecanediylbis-(phosphonate)
[Zr(O3P-(CH2)(16)-PO3)] depositing as ''islands'' on a zirconium-deriv
atized silicon wafer. Images of the zirconated substrate obtained afte
r short exposure to a H2O3P-(CH2)(16)-PO3H2 (C(16)BPA) solution corres
pond to an incomplete monolayer. The surface roughness for an incomple
te monolayer is seven times greater than the initial zirconated surfac
e. Upon further exposure to the C(16)BPA solution, the surface roughne
ss decreases and is ultimately very close to that of the original zirc
onated substrate. The Zr C(16)BPA film is almost completely formed aft
er a deposition time of approximate to 200 min. AFM images of an incom
plete bilayer dim show regions corresponding to the zirconated substra
te and monolayer and bilayer coverage.