M. Izawa et T. Kumihashi, SURFACE MIGRATION AS A DETERMINATE FACTOR OF THE STICKING COEFFICIENTDERIVED FROM THE CHEMISORPTION MODEL, The Journal of chemical physics, 103(21), 1995, pp. 9418-9425
A chemisorption process model has been developed and a sticking coeffi
cient has been formulated by taking the surface migration of physisorb
ed particles into account. This model incorporates Langmuir's model fo
r use when the migration barrier is infinite, and the standard precurs
or model for use when dealing with a bare surface. The migration of in
cident particles was found to make the sticking coefficient independen
t of the surface coverage at low temperatures (approximate to 100 K).
At higher temperatures, the migration appears to be a hidden parameter
in the chemisorption process. The effect of migration can probably be
confirmed, even at room temperature, by analyzing the chemisorption u
sing free radicals. (C) 1995 American Institute of Physics.