FORMATION MECHANISM OF P-TYPE SURFACE CONDUCTIVE LAYER ON DEPOSITED DIAMOND FILMS

A model of the formation of a p-type surface conductive layer on depos ited diamond films is proposed. According to the model, the ionization of acid in water produces oxonium ion (H3O+) which reacts with hydrog en on diamond films and causes the creation of holes in diamond films. The model also explains the disappearance of the p-type surface condu ctive layer by the action of alkaline substances. The experimental res ults concerning the change in electrical resistance at the surface of diamond films can be explained using the proposed model.