SILICON-WAFER HALF-MIRROR IN FAR-INFRARED

Authors
SASANUMA M TAKESHITA Y
Citation
M. Sasanuma et Y. Takeshita, SILICON-WAFER HALF-MIRROR IN FAR-INFRARED, JPN J A P 1, 34(10), 1995, pp. 5844-5846
Citations number
2
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
34
Issue
10
Year of publication
1995
Pages
5844 - 5846
Database
ISI
SICI code
Abstract
Optical properties of silicon wafer are examined. Its low absorptance to IR light and stability in air, make it suitable for use as a half-m irror for light in the far IR.