MODELING OF METAL ELECTRODEPOSITS - ANALYTICAL SOLUTIONS

Authors
HUANG WG HIBBERT DB
Citation
Wg. Huang et Db. Hibbert, MODELING OF METAL ELECTRODEPOSITS - ANALYTICAL SOLUTIONS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 52(5), 1995, pp. 5065-5069
Citations number
4
Categorie Soggetti
Physycs, Mathematical","Phsycs, Fluid & Plasmas
Journal title
Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics → ACNP
ISSN journal
1063651X
Volume
52
Issue
5
Year of publication
1995
Part
B
Pages
5065 - 5069
Database
ISI
SICI code
1063-651X(1995)52:5<5065:MOME-A>2.0.ZU;2-U
Abstract
From a model of metal electrodeposition, expressions of the concentrat ion and current for diffusion, convection, and voltage in one dimensio n are derived. Our models are exact solutions of differential equation s. The effect of dissolution of the anode, direction and speed of conv ection, and voltage on the concentration, current, and growth speed ar e determined. The origin of currents that are independent of the appli ed potential is explained.