BARUO3 THIN-FILMS PREPARED BY PULSED-LASER DEPOSITION

Citation
Wp. Xu et al., BARUO3 THIN-FILMS PREPARED BY PULSED-LASER DEPOSITION, Materials letters, 25(3-4), 1995, pp. 175-178
Citations number
12
Categorie Soggetti
Material Science","Physics, Applied
Journal title
ISSN journal
0167577X
Volume
25
Issue
3-4
Year of publication
1995
Pages
175 - 178
Database
ISI
SICI code
0167-577X(1995)25:3-4<175:BTPBPD>2.0.ZU;2-F
Abstract
High electrical conductive BaRuO3 thin films with (110) perovskite ori entation have been successfully fabricated on Si(100) substrates by pu lsed ArF excimer laser deposition and post-annealing. The resistivity of the films at room temperature is in the range of 10(-2)-10(-3) Ohm cm. Auger electron spectroscopy (AES) measurement shows that the compo sitions uniformly distributed throughout the film. Rutherford backscat tering spectroscopy (RES) analysis indicates that the chemical stoichi ometric ratio is well consistent with the ideal one as in BaRuO3.