Pa. Bobbert et W. Vanhaeringen, LOWEST-ORDER VERTEX-CORRECTION CONTRIBUTION TO THE DIRECT-GAP OF SILICON, Physical review. B, Condensed matter, 49(15), 1994, pp. 10326-10331
We have calculated the contribution of the lowest-order vertex-correct
ion diagram to the direct gap of silicon at the GAMMA-point, taking in
to account the dynamic screening of the electron-electron interaction.
Our best calculation yields a contribution of 0.12 eV. This result su
pports the assumption of the GW approximation that vertex corrections
can be neglected. We do not find a significant shift of the absolute e
nergies.