THIN-FILM MICROSTRUCTURE MODELING THROUGH LINE-SEGMENT SIMULATION

Ultra large scale integration (ULSI) technologies require uniform meta llization layers over extreme topographies of submicron dimensions. On this scale, the fundamental properties of thin films and the processe s during growth are increasingly important considerations. This paper introduces a new thin film growth model called GROFILMS (grain orienta ted film microstructure simulator). By using a line segment algorithm and by the incorporation of interfacial and surface energy calculation s, GROFILMs can depict both the surface and microstructure of a film d eposited over ULSI topography. GROFILMs is capable of simulating many of the fundamental processes involved with thin film growth, such as n ucleation, substrate wetting, grain boundary grooving, columnar growth and crystal facetting. This paper will describe the model and demonst rate the ability of GROFILMs to simulate film growth and produce micro structural and surface information about the film.