ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES

Authors
PINNADUWAGE LA MARTIN MZ CHRISTOPHOROU LG
Citation
La. Pinnaduwage et al., ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES, Contributions to Plasma Physics, 35(4-5), 1995, pp. 433-438
Citations number
18
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
Contributions to Plasma Physics → ACNP
ISSN journal
08631042
Volume
35
Issue
4-5
Year of publication
1995
Pages
433 - 438
Database
ISI
SICI code
0863-1042(1995)35:4-5<433:ENFIAI>2.0.ZU;2-1
Abstract
Oberservation of enhanced electron attachment to ArF-excimer-laser irr adiated methane is reported. Preliminary evidence is presented that la ser-excited superexcited stares of CH4 (or other excited states to whi ch these convert) are responsible for the observed enhanced electron a ttachment, and, that predominantly H- ions are produced via this proce ss. The possible significance of this process for plasma processing di scharges using CH4 and its mixtures is indicated.