PHYSICAL INVESTIGATIONS OF DC MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS

Authors
UTHANNA S REDDY PS NAIDU BS REDDY PJ
Citation
S. Uthanna et al., PHYSICAL INVESTIGATIONS OF DC MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS, Vacuum, 47(1), 1996, pp. 91-93
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
47
Issue
1
Year of publication
1996
Pages
91 - 93
Database
ISI
SICI code
0042-207X(1996)47:1<91:PIODMI>2.0.ZU;2-T
Abstract
Indium tin oxide films were prepared using the DC magnetron reactive s puttering technique onto Coming glass substrates by controlling the de position parameters. The films were characterised by studying their co mposition and structure, and electrical and optical properties. The lo w resistive and high transparent films were generated at 2.4 mTorr of oxygen by maintaining the substrate temperature at 473 K.