SINGLE-CRYSTALLINE, SINGLE-DOMAIN EPITAXY OF PBTIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Single-crystalline and single-domain PbTiO3 films with thickness of 30 00 Angstrom have been prepared by metalorganic chemical vapor depositi on (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso- propoxide titanium. The nature of single-crystalline epitaxy and singl e domain of as-grown films was characterized by x-ray diffraction (XRD ), synchrotron radiation (SR), and Rutherford backscattering (RES). Us ing atomic force microscopy (AFM), the evidence of layer-by-layer grow th was observed. The growth steps on the surface may be attributable t o the formation of single-crystalline and single-domain PbTiO3 film wi th 3000-Angstrom thickness. (C) 1995 American Institute of Physics.