Yf. Chen et al., SINGLE-CRYSTALLINE, SINGLE-DOMAIN EPITAXY OF PBTIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 67(23), 1995, pp. 3503-3505
Single-crystalline and single-domain PbTiO3 films with thickness of 30
00 Angstrom have been prepared by metalorganic chemical vapor depositi
on (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-
propoxide titanium. The nature of single-crystalline epitaxy and singl
e domain of as-grown films was characterized by x-ray diffraction (XRD
), synchrotron radiation (SR), and Rutherford backscattering (RES). Us
ing atomic force microscopy (AFM), the evidence of layer-by-layer grow
th was observed. The growth steps on the surface may be attributable t
o the formation of single-crystalline and single-domain PbTiO3 film wi
th 3000-Angstrom thickness. (C) 1995 American Institute of Physics.