HFM, THE UNIVERSAL SPUTTER METHOD IN SNMS ANALYTICS

For the analysis of surfaces with poor conductivity the use of the ''d irect current sputter process'', usual in SNMS, produces unreproducibl e depth profiles with often widened transition widths. An efficient me thod for eliminating static charging in the case of non-coducting samp les is the use of a high-frequency discharge. By comparison of the dir ect current mode with high frequency mode it is shown, that the use of SNMS with HF sputtering is the universal analysis method for most mat rices, technical surfaces as well as oxidic materials. For non-conduct ing or poorly conducting samples, however, matrix-adjusted factors are to be used.