RADIOFREQUENCY GLOW-DISCHARGE ION-SOURCE FOR HIGH-RESOLUTION MASS-SPECTROMETRY

Authors
SAPRYKIN AI MELCHERS FG BECKER JS DIETZE HJ
Citation
Ai. Saprykin et al., RADIOFREQUENCY GLOW-DISCHARGE ION-SOURCE FOR HIGH-RESOLUTION MASS-SPECTROMETRY, Fresenius' journal of analytical chemistry, 353(5-8), 1995, pp. 570-574
Citations number
7
Categorie Soggetti
Chemistry Analytical
Journal title
Fresenius' journal of analytical chemistry → ACNP
ISSN journal
09370633
Volume
353
Issue
5-8
Year of publication
1995
Pages
570 - 574
Database
ISI
SICI code
0937-0633(1995)353:5-8<570:RGIFHM>2.0.ZU;2-N
Abstract
A radio-frequency powered glow discharge ion source has been developed for a double-focusing mass spectrometer. The sputtering and ionizatio n of conducting, semiconducting and insulating materials have been rea lized using a 13.56 MHz generator to supply the discharge operating po tential. The glow discharge ion source operates stably at argon pressu res of 0.1-1 hPa and radio frequency powers of 10-50 W. The influence of discharge parameters and gas inlet system on sputtering rates and i on signal intensities for semi-insulating gallium arsenide wafers has been investigated.