IN-SITU INVESTIGATION OF SURFACE PROCESSES ON ALGAAS GAAS CLEAVAGE EDGES AS STUDIED BY ATOMIC-FORCE MICROSCOPY/

Citation
T. Prohaska et al., IN-SITU INVESTIGATION OF SURFACE PROCESSES ON ALGAAS GAAS CLEAVAGE EDGES AS STUDIED BY ATOMIC-FORCE MICROSCOPY/, Fresenius' journal of analytical chemistry, 353(5-8), 1995, pp. 670-674
Citations number
15
Categorie Soggetti
Chemistry Analytical
ISSN journal
09370633
Volume
353
Issue
5-8
Year of publication
1995
Pages
670 - 674
Database
ISI
SICI code
0937-0633(1995)353:5-8<670:IIOSPO>2.0.ZU;2-3
Abstract
In-situ observations of surface processes on a freshly cleaved multiqu antum well (MQW) cleavage edge allow to obtain chemical information in addition to the surface topography primarily seen in AFM images. Unde r air the cleavage surface shows a corrugation of about 0.5 nm due to a varying degree of oxidation on the different layers. This oxidation process could be avoided by preparing and imaging the cleavage surface under inert toluene without any contact to ambient atmosphere. After removing the toluene and purging the cell with air, oxidation products developed along the expected AlGaAs layers. A treatment of the oxidiz ed surface with 1 and 10 mmol/L HCl has led to crater formation, which was more pronounced in areas of chemical inhomogeneities and crystall ographic defects. 0.1 mol/L HCl has led to an inversion of the origina l contrast over the whole investigated area, which could be monitored directly in the AFM liquid cell.