R. Resch et al., IN-SITU INVESTIGATION OF ZNS DEPOSITION ON MICA BY SUCCESSIVE IONIC LAYER ADSORPTION AND REACTION METHOD AS STUDIED WITH ATOMIC-FORCE MICROSCOPY, Fresenius' journal of analytical chemistry, 353(5-8), 1995, pp. 772-777
The growth of ZnS thin films on a mica substrate in a Successive Ionic
Layer Adsorption and Reaction (SILAR) process has been studied. The f
ilms were deposited in-situ using the commercial AFM liquid cell as fl
ow-through reactor. Reactants and rinsing water were exchanged in the
cell continuously by a computer controlled valve system. In this way t
he film growth could be observed directly in a time resolved sequence
of images taken after 1 up to 100 cycles. The results show that the st
ability of the films increases between 1 and 30 cycles and that a full
coverage of the surface is reached after approximately 50 cycles.