TEMPERATURE-DEPENDENCE OF STRAIN IN ZNSE(EPILAYER) GAAS(EPILAYER)/

Citation
Rj. Thomas et al., TEMPERATURE-DEPENDENCE OF STRAIN IN ZNSE(EPILAYER) GAAS(EPILAYER)/, Journal of applied physics, 78(11), 1995, pp. 6569-6573
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
78
Issue
11
Year of publication
1995
Pages
6569 - 6573
Database
ISI
SICI code
0021-8979(1995)78:11<6569:TOSIZG>2.0.ZU;2-1
Abstract
A study of biaxial strain as a function of temperature in a ZnSe epila yer grown on a GaAs substrate is presented. The strains are determined by measuring the heavy- and light-hole related excitonic transitions via photomodulated spectroscopy. The strain is found to increase with increasing temperature. The data are compared with a calculation using a previously determined elastic constant and thermal expansion coeffi cients. The temperature dependence determined here allows a comparison of various other optical measurements performed at different temperat ures. (C) 1995 American Institute of Physics.