Ia. Artiyukov et al., MIRROR X-RAY MICROSCOPE FOR THE INVESTIGA TION OF OBJECTS ILLUMINATEDBY LASER-PLASMA RADIATION, Kvantovaa elektronika, 22(9), 1995, pp. 951-954
Multilayer windows were used in an x-ray optical system which formed m
agnified images of microscopic objects with a resolution of similar to
0.2 mu m at the wavelength 20 nm. The system consisted of a laser-pla
sma source, an x-ray condenser, a Schwarzschild objective with a magni
fication 20, a set of filters, and a detector. The quality of the x-ra
y optics and the precision of alignment of the system components made
it possible to attain a resolution of similar to 0.2 mu m when the ful
l aperture of the objective was used. A single shot in the form of the
second harmonic of an Nd laser, generating pulses of similar to 0.5 J
energy and similar to 1.5 ns duration, was sufficient for exposure.