Electrical deactivation of arsenic in highly doped silicon has been st
udied using the positron-beam technique. Direct experimental evidence
linking the formation of arsenic-vacancy complexes (i.e., As-n-v) to t
he deactivation process is reported. The average number of arsenic ato
ms per complex, (n) over bar>2, was determined by comparing the observ
ed complex concentrations with those of the deactivated arsenic inferr
ed from Hall-effect measurements. (C) 1995 American Institute of Physi
cs.