U. Diebold et Nd. Shinn, ADSORPTION AND THERMAL-STABILITY OF MN ON TIO2(110) - 2P X-RAY-ABSORPTION SPECTROSCOPY AND SOFT-X-RAY PHOTOEMISSION, Surface science, 343(1-2), 1995, pp. 53-60
X-ray absorption and photoelectron spectroscopies are used to study th
e adsorption and reaction of Mn films deposited on TiO2(110) at 25 deg
rees C and after annealing to similar to 650 degrees C. Fractional mon
olayer coverages of Mn at 25 degrees C produce a reactive, disordered
interface consisting of reduced Ti cations and oxidized Mn overlayer a
toms. Metallic Mn is found only for thicker layers at 25 degrees C. An
nealing Mn films to -650 degrees C leads to several changes that are l
argely independent of initial overlayer coverage: Metallic Mn thermall
y desorbs leaving only Mn2+ ions; interfacial Ti cations are largely r
e-oxidized to the Ti4+ state; and the local order is increased at the
interface. The formation of a crystalline ternary surface oxide, MnTiO
x, is proposed to account for these chemical and structural changes.