CHARACTERIZATION OF OPTICAL THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY

Spectroscopic ellipsometry was used to rapidly and nondestructively ch aracterize ion-plated SiO2 and Ta2O5 films on glass substrates as a fu nction of temperature. The analysis provided the density (as a functio n of depth) and optical properties of the films. The SiO2 film had a h igher refractive index than is typical for thermally grown SiO2. This was attributed to compaction of the film during the deposition process . Similarly, the ion-plated Ta2O5 film had the high refractive index c haracteristic of a high-density film. The films were not affected stro ngly by temperature during heating >100 degrees C.